Pendant Modification of Poly(methyl methacrylate) to Enhance Its Stability against Photoirradiation

Photostabilization of functional polymeric materials is important for protection against aging and ultraviolet (UV) irradiation. There is, therefore, the impetus to modify polymers increase their resistance photodegradation photooxidation on extended exposure UV light in harsh conditions. Various additives have been designed synthesized recent years, potential as photostabilizers has explored. Reported here effect pendant functionalization poly(methyl methacrylate) (PMMA) through organometallic moiety incorporation into polymer’s backbone. The reaction PMMA with ethylenediamine leads formation an amino residue that can react salicylaldehyde produce corresponding Schiff base. Adding metal chlorides (zinc, copper, nickel, cobalt) led residues chains. Thin films modified unmodified were produced irradiated determine modification photostability. photostabilization was assessed using a range methods, including infrared spectroscopy, weight loss, decomposition rate constant, surface morphology. incorporating organic base complexes showed less photodecomposition than polymer or one containing only. Thus, metals significantly reduced materials. base-cobalt unit least damage due photoirradiation, followed by those zinc, order.